ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,160, issued on July 14, was assigned to Kokusai Electric Corp. (Tokyo). "Nozzle cleaning method, substrate processing method, method of man... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,161, issued on July 14, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and INDUSTRY-ACADEMIC COOPERATION FOUNDATION, U... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,162, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "CVD device pumping liner" was inven... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,163, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Reactor for coating particles in stationary chamber ... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,164, issued on July 14, was assigned to Lam Research Salzburg GmbH (Salzburg-Gnigl, Austria). "Distribution body for distributing a process... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,165, issued on July 14, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Method of forming holes from both sides of substrate... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,166, issued on July 14, was assigned to AIXTRON SE (Herzogenrath, Germany). "Gas inlet device for a CVD reactor" was invented by Martin Eic... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,167, issued on July 14, was assigned to ADVANTEC Co. LTD. (Tokyo). "Stage for heating and cooling object" was invented by Yuji Masuda (Toky... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,168, issued on July 14, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Multiple-chamber reactor for selective deposition of si... और पढ़ें
ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,169, issued on July 14, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate liquid processing method and substrate liquid processing ap... और पढ़ें